4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

James D. Carducci

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Adjusting DC bias voltage in plasma chamber

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Adjusting DC bias voltage in plasma chamber

Coating apparatus – Gas or vapor deposition – With treating means
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Apparatus and method to confine plasma and reduce flow...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus
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Capacitively coupled plasma reactor with uniform radial...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Configurable single substrate wet-dry integrated cluster...

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
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Profile ID: LFUS-PAI-P-2078865

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