4. Electricity: electrical systems and devices
  5. Electric charge generating or conducting means
  6. Use of forces of electric charge or field

Paul E. Luscher

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Adjusting DC bias voltage in plasma chamber

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Adjusting DC bias voltage in plasma chamber

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Apparatus and method for actively controlling the DC potential o

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent

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Apparatus and method for endpoint control and plasma monitoring

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Apparatus for measuring pedestal and substrate temperature...

Thermal measuring and testing – Temperature measurement – Combined with diverse art device
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Profile ID: LFUS-PAI-P-49154

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