Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2006-03-21
2006-03-21
Pham, Long (Department: 2814)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S758000, C438S759000, C438S787000, C438S789000, C438S790000
Reexamination Certificate
active
07015144
ABSTRACT:
Compositions that can be used in semiconductor manufacturing processes, comprising perhydro-polysilazane having a weight average molecular weight of about 300 to about 3,000 and a polydispersity index of about 1.8 to about 3.0 are provided. Solutions comprising the compositions of the present invention, methods of forming films in a semiconductor manufacturing process, and methods of manufacturing semiconductor devices are also provided.
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Goo Ju-seon
Hong Eunkee
Kim Hong Gun
Na Kyu-tae
Myers Bigel & Sibley & Sajovec
Rao Shrinivas H.
Samsung Electronics Co,. Ltd.
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