Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2011-01-18
2011-01-18
Smith, Zandra (Department: 2895)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S671000, C438S700000, C438S703000, C438S708000
Reexamination Certificate
active
07871933
ABSTRACT:
A stepper is combined with hardware that deposits a layer of material in the course of forming an integrated circuit, thus performing the deposition, patterning and cleaning without exposing the wafer to a transfer between tools and combining the function of three tools in a composite tool. The pattern-defining material is removed by the application of UV light through the mask of the stepper, thereby eliminating the bake and development steps of the prior art method. Similarly, a flood exposure of UV eliminates the cleaning steps of the prior art method.
REFERENCES:
patent: 4283482 (1981-08-01), Hattori et al.
patent: 5310624 (1994-05-01), Ehrlich
patent: 5413664 (1995-05-01), Yagi et al.
patent: 5714798 (1998-02-01), Armacost et al.
patent: 6610552 (2003-08-01), Fujimori et al.
patent: 2002/0096490 (2002-07-01), Yu
patent: 2004/0135226 (2004-07-01), Yoshimura et al.
patent: 2005/0017624 (2005-01-01), Novet et al.
patent: 2005/0133476 (2005-06-01), Islam et al.
patent: 2006/0065628 (2006-03-01), Vahedi et al.
patent: 2006/0067009 (2006-03-01), Cyrille et al.
patent: 2006/0091780 (2006-05-01), Minami
patent: 2006/0175084 (2006-08-01), Okamoto et al.
patent: 2006/0248967 (2006-11-01), Tsukuda et al.
patent: 2007/0085459 (2007-04-01), Hudspeth et al.
patent: 2007/0127006 (2007-06-01), Shibazaki
patent: 2007/0298609 (2007-12-01), Yakobson et al.
patent: 2008/0006888 (2008-01-01), Yun et al.
patent: 2008/0227030 (2008-09-01), Moreau et al.
patent: 2 156 834 (1985-10-01), None
patent: 07 254556 (1995-10-01), None
patent: 07 305027 (1995-11-01), None
patent: 2000 165996 (2000-06-01), None
J. J. Cumo, et al., “Low-Temperature Surface Discriminating Deposition Process”, IBM TDB, vol. 11, No. 3, 1968, p. 253.
International Search Report and the Written Opinion of the International Searching Authority, International Application No. PCT/EP2006/068188.
Chudzik Michael P.
Shepard, Jr. Joseph F.
Brown Katherine S.
International Business Machines - Corporation
Jaklitsch Lisa
Lee Jae
Smith Zandra
LandOfFree
Combined stepper and deposition tool does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Combined stepper and deposition tool, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Combined stepper and deposition tool will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2648121