Cleaning of CVD chambers using remote source with cxfyoz...

Details Cleaning of CVD chambers using remote source with cxfyoz... Cleaning of CVD chambers using remote source with cxfyoz...

2005-08-02

2005-08-02

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

C134S001100, C134S022100, C134S031000, C134S036000, C134S902000, C438S905000

Reexamination Certificate

active

06923189

ABSTRACT:
A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to generate or regenerate reactive species. The reactive species are generated from a carbon and fluorine-containing gas and an oxygen source.

REFERENCES:
patent: 4820377 (1989-04-01), Davis et al.
patent: 5158644 (1992-10-01), Cheung et al.
patent: 5454903 (1995-10-01), Redeker et al.
patent: 5788778 (1998-08-01), Shang et al.
patent: 5886473 (1999-03-01), Watanabe et al.
patent: 6107192 (2000-08-01), Subrahmanyan et al.
patent: 6164295 (2000-12-01), Ui et al.
patent: 6271148 (2001-08-01), Kao et al.
patent: 6274058 (2001-08-01), Rajagopalan et al.
patent: 6379575 (2002-04-01), Yin et al.
patent: 6432255 (2002-08-01), Sun et al.
patent: 6435197 (2002-08-01), Shin et al.
patent: 6437512 (2002-08-01), Chen et al.
patent: 6461975 (2002-10-01), Jeong et al.
patent: 6569257 (2003-05-01), Nguyen et al.
patent: 6736147 (2004-05-01), Satoh et al.
patent: 2001/0025645 (2001-10-01), Shin et al.
patent: 2002/0052114 (2002-05-01), Marks
patent: 2002/0104467 (2002-08-01), Chandran et al.
patent: 2002/0117473 (2002-08-01), Yanase
patent: 0 555 546 (1993-08-01), None
patent: 0 697 467 (2003-02-01), None
patent: 1 304 731 (2003-04-01), None
patent: 1118692 (2001-07-01), None
patent: WO 02/12587 (2002-02-01), None
patent: WO 02/078073 (2002-10-01), None
U.S. Appl. No. 09/710,357, filed Nov. 9, 2000.

Affiliated with

Also associated with

Rating

Cleaning of CVD chambers using remote source with cxfyoz... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning of CVD chambers using remote source with cxfyoz..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning of CVD chambers using remote source with cxfyoz... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3472461