4. Cleaning and liquid contact with solids
  5. Processes
  6. Hollow work, internal surface treatment

Annamalai Lakshmanan

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Adhesion improvement for low k dielectrics to conductive...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Bi-layer approach for a hermetic low dielectric constant...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Cleaning of CVD chambers using remote source with cxfyoz...

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate

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Hermetic low dielectric constant layer for barrier applications

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Interface engineering to improve adhesion between low k stacks

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Profile ID: LFUS-PAI-P-2870146

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