Chemical vapor deposition process

Details Chemical vapor deposition process Chemical vapor deposition process

2007-01-11

2010-12-14

Menz, Douglas M (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Multiple layers

C438S758000

Reexamination Certificate

active

07851377

ABSTRACT:
A chemical vapor deposition (CVD) method includes placing a semiconductor wafer into a reaction chamber; introducing a precursor into the reaction chamber; activating the precursor to a high-energy state using a non-direct plasma energy source; and reacting the precursor to form a film on the semiconductor wafer.

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