Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2007-11-06
2007-11-06
Meeks, Timothy (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
C427S569000, C118S719000
Reexamination Certificate
active
10873600
ABSTRACT:
A chemical vapor deposition process is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower process region, each of the ion shower grids having plural orifices in mutual registration from grid to grid, each orifice being oriented in a non-parallel direction relative to a surface plane of the respective ion shower grid. A workpiece is placed in the process region, so that a workpiece surface of the workpiece is generally facing a surface plane of the nearest one of the ion shower grids, and a gas mixture comprising a deposition precursor species is furnished into the ion generation region. The process region is evacuated at an evacuation rate sufficient to create a pressure drop across the plural ion shower grids between the ion generation and process regions whereby the pressure in the ion generation region is several times the pressure in the process region. The process further includes applying plasma source power to generate a plasma of the deposition precursor species in the ion generation region and applying successive grid potentials to successive ones of the grids.
REFERENCES:
patent: 2344138 (1944-03-01), Drummond
patent: 3109100 (1963-10-01), Gecewicz
patent: 3576685 (1971-04-01), Swann et al.
patent: 3907616 (1975-09-01), Wiemer
patent: 4116791 (1978-09-01), Zega
patent: 4119881 (1978-10-01), Calderon
patent: 4158589 (1979-06-01), Keller et al.
patent: 4382099 (1983-05-01), Legge et al.
patent: 4385946 (1983-05-01), Finegan et al.
patent: 4434036 (1984-02-01), Hoerschelmann et al.
patent: 4450031 (1984-05-01), Ono et al.
patent: 4465529 (1984-08-01), Arima et al.
patent: 4478677 (1984-10-01), Chen et al.
patent: 4481229 (1984-11-01), Suzuki et al.
patent: 4490210 (1984-12-01), Chen et al.
patent: 4490211 (1984-12-01), Chen et al.
patent: 4493745 (1985-01-01), Chen et al.
patent: 4500563 (1985-02-01), Ellenberger et al.
patent: 4511430 (1985-04-01), Chen et al.
patent: 4521441 (1985-06-01), Flowers
patent: 4523971 (1985-06-01), Cuomo et al.
patent: 4534816 (1985-08-01), Chen et al.
patent: 4539217 (1985-09-01), Farley
patent: 4565588 (1986-01-01), Seki et al.
patent: 4602981 (1986-07-01), Chen et al.
patent: 4671849 (1987-06-01), Chen et al.
patent: 4698104 (1987-10-01), Barker et al.
patent: 4716491 (1987-12-01), Ohno et al.
patent: 4741799 (1988-05-01), Chen et al.
patent: 4759948 (1988-07-01), Hashimoto et al.
patent: 4764394 (1988-08-01), Conrad
patent: 4778561 (1988-10-01), Ghanbari
patent: 4792378 (1988-12-01), Rose et al.
patent: 4824544 (1989-04-01), Mikaleswen et al.
patent: 4867859 (1989-09-01), Harada et al.
patent: 4871421 (1989-10-01), Ogle et al.
patent: 4892753 (1990-01-01), Weng et al.
patent: 4901667 (1990-02-01), Suzuki et al.
patent: 4912065 (1990-03-01), Mizuno et al.
patent: 4937205 (1990-06-01), Nakayama et al.
patent: 4948458 (1990-08-01), Ogle
patent: 5015331 (1991-05-01), Powell
patent: 5040046 (1991-08-01), Chhabra et al.
patent: 5061511 (1991-10-01), Saitoh et al.
patent: 5061838 (1991-10-01), Lane et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5106827 (1992-04-01), Borden et al.
patent: 5107201 (1992-04-01), Ogle
patent: 5252178 (1993-10-01), Moslehi
patent: 5270250 (1993-12-01), Murai et al.
patent: 5277751 (1994-01-01), Ogle
patent: 5279669 (1994-01-01), Lee
patent: 5284544 (1994-02-01), Mizutani et al.
patent: 5286331 (1994-02-01), Chen et al.
patent: 5288650 (1994-02-01), Sandow
patent: 5290358 (1994-03-01), Rubloff et al.
patent: 5290382 (1994-03-01), Zarowin et al.
patent: 5312778 (1994-05-01), Collins et al.
patent: 5344352 (1994-09-01), Horne et al.
patent: 5354381 (1994-10-01), Sheng
patent: 5423940 (1995-06-01), Chene et al.
patent: 5423945 (1995-06-01), Marks et al.
patent: 5435881 (1995-07-01), Ogle
patent: 5468955 (1995-11-01), Chen et al.
patent: 5505780 (1996-04-01), Dalvie et al.
patent: 5514603 (1996-05-01), Sato
patent: 5520209 (1996-05-01), Goins et al.
patent: 5529670 (1996-06-01), Ryan et al.
patent: 5542559 (1996-08-01), Kawakami et al.
patent: 5561072 (1996-10-01), Saito
patent: 5562947 (1996-10-01), White et al.
patent: 5569363 (1996-10-01), Bayer et al.
patent: 5572038 (1996-11-01), Sheng et al.
patent: 5572398 (1996-11-01), Federlin et al.
patent: 5587038 (1996-12-01), Cecchi et al.
patent: 5627435 (1997-05-01), Jansen et al.
patent: 5643428 (1997-07-01), Krivokapic et al.
patent: 5643838 (1997-07-01), Dean et al.
patent: 5648701 (1997-07-01), Hooke et al.
patent: 5653811 (1997-08-01), Chan
patent: 5654043 (1997-08-01), Shao et al.
patent: 5660895 (1997-08-01), Lee et al.
patent: 5665640 (1997-09-01), Foster et al.
patent: 5674321 (1997-10-01), Pu et al.
patent: 5683517 (1997-11-01), Shan
patent: 5711812 (1998-01-01), Chapek et al.
patent: 5718798 (1998-02-01), Deregibus
patent: 5728276 (1998-03-01), Katsuki et al.
patent: 5763020 (1998-06-01), Yang
patent: 5770982 (1998-06-01), Moore
patent: 5782276 (1998-07-01), Kilgore
patent: 5785796 (1998-07-01), Lee
patent: 5882468 (1999-03-01), Crockett et al.
patent: 5888413 (1999-03-01), Okumura et al.
patent: 5897752 (1999-04-01), Hong et al.
patent: 5911832 (1999-06-01), Denholm et al.
patent: 5935077 (1999-08-01), Ogle
patent: 5944942 (1999-08-01), Ogle
patent: 5948168 (1999-09-01), Shan et al.
patent: 5959305 (1999-09-01), Mack et al.
patent: 5985742 (1999-11-01), Henley et al.
patent: 5994207 (1999-11-01), Henley et al.
patent: 5994236 (1999-11-01), Ogle
patent: 5998933 (1999-12-01), Shun'ko
patent: 6000360 (1999-12-01), Koshimizu
patent: 6013567 (2000-01-01), Henley et al.
patent: 6017414 (2000-01-01), Koemtzopoulos et al.
patent: 6020592 (2000-02-01), Liebert et al.
patent: 6036821 (2000-03-01), Warren
patent: 6041735 (2000-03-01), Murzin et al.
patent: 6050218 (2000-04-01), Chen et al.
patent: 6071573 (2000-06-01), Koemtzopoulos et al.
patent: 6076483 (2000-06-01), Shintani et al.
patent: 6083363 (2000-07-01), Ashtiani et al.
patent: 6096661 (2000-08-01), Ngo et al.
patent: 6101971 (2000-08-01), Denholm et al.
patent: 6103599 (2000-08-01), Henley et al.
patent: 6132552 (2000-10-01), Donohoe et al.
patent: 6150628 (2000-11-01), Smith et al.
patent: 6153524 (2000-11-01), Henley et al.
patent: 6155090 (2000-12-01), Rubenson
patent: 6164241 (2000-12-01), Chen et al.
patent: 6165376 (2000-12-01), Miyake et al.
patent: 6174450 (2001-01-01), Patrick et al.
patent: 6174743 (2001-01-01), Pangrle et al.
patent: 6182604 (2001-02-01), Goeckner et al.
patent: 6187110 (2001-02-01), Henley et al.
patent: 6207005 (2001-03-01), Henley et al.
patent: 6237527 (2001-05-01), Kellerman et al.
patent: 6239553 (2001-05-01), Barnes et al.
patent: 6248642 (2001-06-01), Donlan et al.
patent: 6265328 (2001-07-01), Henley et al.
patent: 6291313 (2001-09-01), Henley et al.
patent: 6291939 (2001-09-01), Nishida
patent: 6300643 (2001-10-01), Fang et al.
patent: 6303519 (2001-10-01), Hsiao
patent: 6305316 (2001-10-01), DiVergilio et al.
patent: 6331701 (2001-12-01), Chen et al.
patent: 6335536 (2002-01-01), Goeckner et al.
patent: 6339297 (2002-01-01), Sugai et al.
patent: 6341574 (2002-01-01), Bailey, III et al.
patent: 6348126 (2002-02-01), Hanawa et al.
patent: 6350697 (2002-02-01), Richardson et al.
patent: 6352049 (2002-03-01), Yin et al.
patent: 6361667 (2002-03-01), Kobayashi et al.
patent: 6392351 (2002-05-01), Shun'ko
patent: 6403453 (2002-06-01), Ono et al.
patent: 6410449 (2002-06-01), Hanawa et al.
patent: 6417078 (2002-07-01), Dolan et al.
patent: 6418874 (2002-07-01), Cox et al.
patent: 6426015 (2002-07-01), Xia et al.
patent: 6433553 (2002-08-01), Goeckner et al.
patent: 6453842 (2002-09-01), Hanawa et al.
patent: 6461972 (2002-10-01), Kabansky
patent: 6468388 (2002-10-01), Hanawa et al.
patent: 6494986 (2002-12-01), Hanawa et al.
patent: 6511899 (2003-01-01), Henley et al.
patent: 6512333 (2003-01-01), Chen
patent: 6514838 (2003-02-01), Chan
patent: 6521897 (2003-02-01), Lindquist et al.
patent: 6528391 (2003-03-01), Henley et al.
patent: 6551446 (2003-04-01), Hanawa et al.
patent: 6559408 (2003-05-01), Smith et al.
patent: 6579805 (2003-06-01), Bar-Gadda
patent: 658299
Al-Bayati Amir
Collins Kenneth S.
Hanawa Hiroji
Nguyen Andrew
Ramaswamy Kartik
Applied Materials Inc.
Law Office of Robert M. Wallace
Meeks Timothy
Stouffer Kelly M
LandOfFree
Chemical vapor deposition plasma process using plural ion... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemical vapor deposition plasma process using plural ion..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition plasma process using plural ion... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3807702