Chemical vapor deposition chamber

Details Chemical vapor deposition chamber Chemical vapor deposition chamber

1994-02-23

1997-12-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118728, 118725, 118500, C23C 1600

Patent

active

056955685

ABSTRACT:
An improved deposition chamber deposits useful layers on substrates. The improved chamber includes a substrate edge protection system which, in combination with a purge gas, protects selected portions of the edge and underside of the substrate from the deposition gas while preventing the creation of a masked area on the substrate edge. The substrate is supported on a solid receiving plate, which is supported by a stem having a heat limiting member and a shroud to protect the stem and a positioning assembly aligns the substrate to the receiving plate.

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