Chemical mechanical polishing with friction-based control

Details Chemical mechanical polishing with friction-based control Chemical mechanical polishing with friction-based control

2005-05-03

2005-05-03

Rose, Robert A. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

With indicating

C451S005000

Reexamination Certificate

active

06887129

ABSTRACT:
A chemical mechanical polishing apparatus has a polishing surface, a carrier head to press a substrate against the polishing surface with a controllable pressure, a motor to generate relative motion between the polishing surface and the carrier head at a velocity, and a controller. The controller is configured to vary at least one of the pressure and velocity in response to a signal that depends on the friction between the substrate and the polishing surface to maintain a constant torque, frictional force, or coefficient of friction.

REFERENCES:
patent: 5069002 (1991-12-01), Sandhu et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5597341 (1997-01-01), Kodera et al.
patent: 5639388 (1997-06-01), Kimura et al.
patent: 5647952 (1997-07-01), Chen
patent: 5700180 (1997-12-01), Sandhu et al.
patent: 5720845 (1998-02-01), Liu
patent: 5733176 (1998-03-01), Robinson et al.
patent: 5738562 (1998-04-01), Doan et al.
patent: 5743784 (1998-04-01), Birang et al.
patent: 5830041 (1998-11-01), Takahashi et al.
patent: 5846882 (1998-12-01), Birang
patent: 5851135 (1998-12-01), Sandhu et al.
patent: 5860847 (1999-01-01), Sakurai et al.
patent: 5914275 (1999-06-01), Kodera et al.
patent: 5948205 (1999-09-01), Kodera et al.
patent: 6046111 (2000-04-01), Robinson
patent: 6120347 (2000-09-01), Sandhu et al.
patent: 6191037 (2001-02-01), Robinson et al.
patent: 6206754 (2001-03-01), Moore
patent: 6238590 (2001-05-01), Fischer et al.
patent: 6257953 (2001-07-01), Gitis et al.
patent: 6283829 (2001-09-01), Molnar
patent: 6340434 (2002-01-01), Mizuno et al.
patent: 6623334 (2003-09-01), Birang et al.
patent: 0 771 611 (1997-05-01), None

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