Auxiliary magnet array in conjunction with magnetron sputtering

Details Auxiliary magnet array in conjunction with magnetron sputtering Auxiliary magnet array in conjunction with magnetron sputtering

2005-04-05

2005-04-05

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298190, C204S298170, C204S298220

Reexamination Certificate

active

06875321

ABSTRACT:
An array of auxiliary magnets is disclosed that is positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target. The magnetron preferably is a small, strong one having a stronger outer pole of a first magnetic polarity surrounding a weaker outer pole of a second magnetic polarity and rotates about the central axis of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets or electromagnets.

REFERENCES:
patent: 4871433 (1989-10-01), Wagner et al.
patent: 5133825 (1992-07-01), Hakamata et al.
patent: 5178739 (1993-01-01), Barnes et al.
patent: 5482611 (1996-01-01), Helmer et al.
patent: 5593551 (1997-01-01), Lai
patent: 5733405 (1998-03-01), Taki et al.
patent: 5907220 (1999-05-01), Tepman et al.
patent: 6014943 (2000-01-01), Arami et al.
patent: 6077403 (2000-06-01), Kobayashi et al.
patent: 6080285 (2000-06-01), Liu et al.
patent: 6159351 (2000-12-01), J'Afer et al.
patent: 6163006 (2000-12-01), Doughty et al.
patent: 6179973 (2001-01-01), Lai et al.
patent: 6193854 (2001-02-01), Lai et al.
patent: 6290825 (2001-09-01), Fu
patent: 6352629 (2002-03-01), Wang
patent: 6413383 (2002-07-01), Chiang et al.
patent: 6423192 (2002-07-01), Wada et al.
patent: 6610184 (2003-08-01), Ding et al.
patent: 20030089601 (2003-05-01), Ding et al.
patent: 0 653 776 (1995-05-01), None
patent: 1 091 016 (2001-04-01), None
patent: 1 119 017 (2001-07-01), None
patent: 1 174 902 (2002-01-01), None
patent: 10204614 (1998-08-01), None
patent: WO 0005745 (2000-02-01), None
patent: WO 0211176 (2002-02-01), None
patent: WO 0237528 (2002-05-01), None
Ashtiani et al., “A new hollow-cathode magnetron source for 0.10μm copper applications”, 0-7803-6327-2, 2000, pp. 37-39.

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