Apparatus for processing substrates having a film formed on a su

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work

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118712, 118641, 118 52, 118 56, 118 66, 118319, 118320, 118500, 134902, 414935, 414936, 414937, 414941, B05C 500

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active

055650341

ABSTRACT:
A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding member, and a moving member for detachably supplying a plurality of object holding member and simultaneously moving the plurality of object holding member, and a heat-treatment section having a second transfer member for transferring the object placed on the object holding member to a heat-treatment section for heat-treating the plurality of objects, which have undergone the coating process, in accordance with a batch process.

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patent: 5404894 (1995-04-01), Shiraiwa

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