4. Coating apparatus
  5. With means to centrifuge work

Tomoko Ishimoto

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Apparatus for processing substrates having a film formed on a su

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Patent

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Method of substrate processing to form a film on multiple target

Coating processes – Centrifugal force utilized
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Semiconductor wafer processing apparatus including localized hum

Coating apparatus – With means to centrifuge work
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Profile ID: LFUS-PAI-P-270897

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