Apparatus and methods for improving the stability of RF...

Details Apparatus and methods for improving the stability of RF... Apparatus and methods for improving the stability of RF...

2005-01-04

2005-01-04

Vannucci, James (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C333S08100R

Reexamination Certificate

active

06838832

ABSTRACT:
Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.

REFERENCES:
patent: 5866985 (1999-02-01), Coultas et al.
patent: 6259334 (2001-07-01), Howald
patent: 6583572 (2003-06-01), Veltrop et al.
patent: 6646385 (2003-11-01), Howald et al.
patent: 20030215373 (2003-11-01), Reyzelman et al.

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