Apparatus and method for identifying photomask pattern defects

Details Apparatus and method for identifying photomask pattern defects Apparatus and method for identifying photomask pattern defects

1996-01-17

1998-06-16

Hantis, K.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

G01B 1100

Patent

active

057679746

ABSTRACT:
An apparatus and method for inspecting photomask pattern defects, discriminating true defects from false ones, efficiently detects only the true defects. The apparatus includes a light source; an irradiation section for transmitting light from the light source to a photomask; a light detecting section for detecting the light passing through transparent parts of the photomask; an image processing section for acquiring image data of the pattern according to signals from the light detecting section; a first condition setting section for setting a coordinate threshold that defines a misregistration defect in the pattern; a second condition setting section for setting an area threshold that defines an area defect of the pattern; a testing section that determines whether the coordinates of a pattern feature and the area of the pattern satisfy the thresholds upon comparison to a second pattern; and an output section for outputting a signal indicating a defect only when at least one of the thresholds is exceeded.

REFERENCES:
patent: 4579455 (1986-04-01), Levy et al.
patent: 5098191 (1992-03-01), Noguchi et al.
patent: 5270796 (1993-12-01), Tokui et al.

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