4. Optics: measuring and testing
  5. By configuration comparison
  6. With comparison to master, desired shape, or reference voltage

Hisayoshi Higashiguchi

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Apparatus and method for identifying photomask pattern defects

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Mask inspection system and method of manufacturing...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
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Profile ID: LFUS-PAI-P-1642590

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