Antenna for plasma processor apparatus

Details Antenna for plasma processor apparatus Antenna for plasma processor apparatus

2011-03-15

2011-03-15

Alejandro, Luz L. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C118S7230IR, C118S7230AN, C315S111510

Reexamination Certificate

active

07905982

ABSTRACT:
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor.

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