Agent for forming coating for narrowing patterns and method...

Details Agent for forming coating for narrowing patterns and method... Agent for forming coating for narrowing patterns and method...

2007-06-26

2007-06-26

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S313000, C430S315000, C430S322000, C430S324000, C430S330000, C427S271000, C427S372200, C427S384000, C427S385500, C438S760000, C524S555000, C524S556000, C525S206000, C526S263000, C526S316000, C548S325500

Reexamination Certificate

active

10471772

ABSTRACT:
It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between the adjacent photoresist patterns is lessened, further characterized by containing a water-soluble polymer and a surfactant. Also disclosed is a method of forming fine-line patterns using the over-coating agent. According to the invention, one can obtain fine-line patterns which exhibit good profiles while satisfying the characteristics required of semiconductor devices, being excellent in controlling the dimension of patterns.

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