Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1999-07-26
2000-08-29
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430326, 430328, 4302711, G03F 726
Patent
active
061106534
ABSTRACT:
A composition used to form an acid sensitive antireflective coating (ARC) includes a water soluble resin and a cross-linker. Radiation adsorptive components may be provided as part of the resin or, more preferably, as a separate dye. The composition may be applied on a substrate as a radiation adsorbing layer and additionally cross-linked to form an acid sensitive, water insoluble ARC on which a photopatterning resist (PPR) layer may be formed. Being acid sensitive, selected portions of an ARC formed from the composition may be removed by a suitable reversal of the cross-linking followed by a develop step, preferably with an aqueous developer, more preferably de-ionized water. The water soluble resin is preferably hydroxystyrene-sulfonated styrene copolymer, poly(2-isopropenyl-2-oxazoline), or poly(acrylic acid), the cross-linker is preferably an acetal diacid or a water soluble divinyl ether, and the dye is preferably 9-anthracene methanol or a squaric acid derivative. If a suitable photoacid generator (PAG) is included then an ARC formed from such components may exhibit a photosensitivity similar to or even lower than that of the overlying PPR. The photosensitivity is preferably less than about 900 mJ/cm.sup.2, more preferably 100 mJ/cm.sup.2 or less.
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Holmes Steven J.
Rabidoux Paul A.
Ashton Rosemary
Baxter Janet
International Business Machines - Corporation
Sabo William D.
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