Multiple micro inlet silane injection system for the jet vapor d

Details Multiple micro inlet silane injection system for the jet vapor d Multiple micro inlet silane injection system for the jet vapor d

1998-12-29

2000-11-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723R, C23C 1650

Patent

active

061487643

ABSTRACT:
Introducing a silane reactant gas into a Jet Vapor Deposition microwave discharge source for deposition of silicon nitride films at increased rate. An array of regularly spaced micro-inlets in a JVD microwave discharge source delivers the silane reactant gas and act as non-interfering silane injectors to give a rate increase proportional to the number of micro-inlets while preserving deposited film quality.

REFERENCES:
patent: 5356672 (1994-10-01), Schmitt
patent: 5356673 (1994-10-01), Schmitt

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