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Monitoring and controlling plasma processes via optical emission

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Patent

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Monitoring of eching

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Patent

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Monitoring of nitrided oxide gate dielectrics by...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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Monitoring system for determining progress in a fabrication...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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Monitoring the reduction in thickness as material is removed...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Multi beam scanning with bright/dark field imaging

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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Multi beam scanning with bright/dark field imaging

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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Multi beam scanning with bright/dark field imaging

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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