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Polymers containing protected styrene and unprotected hydroxbenz

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Polymers for aqueous processed photoresists

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Polymers for photoresist compositions for microlithography

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Polymers having N,N-disubstituted sulfonamide pendent groups and

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Polymers with mixed photoacid-labile groups and photoresists...

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Polymers, chemical amplification resist compositions and...

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Polymers, chemical amplification resist compositions and...

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Polymers, chemical amplification resist compositions and...

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Polymers, chemical amplification resist compositions and...

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Polymers, chemical amplification resist compositions and...

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Polymers, positive resist compositions and patterning process

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Polymers, processes for polymer synthesis and photoresist...

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Polymers, processes for polymer synthesis and photoresist...

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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Polymers, resist compositions and patterning process

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