Polymers containing protected styrene and unprotected hydroxbenz

Details Polymers containing protected styrene and unprotected hydroxbenz Polymers containing protected styrene and unprotected hydroxbenz

1998-05-05

1999-01-26

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302831, G03C 1492

Patent

active

058637010

ABSTRACT:
Novel polymers may be used in resist formulations for the fabrication of printing plates and circuit boards and, in particular, for the fabrication of integrated circuits. No autocatalytic decomposition of the compounds occurs and the resist film obtained therewith has good adhesive properties.

REFERENCES:
patent: 5328973 (1994-07-01), Roeschert et al.

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