Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-01-11
2005-01-11
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000
Reexamination Certificate
active
06841331
ABSTRACT:
The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
REFERENCES:
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patent: 6028123 (2000-02-01), Hirayama et al.
patent: 6602646 (2003-08-01), Sato et al.
patent: 1 074 566 (2001-02-01), None
W. Billmeyer, Jr., ed., Textbook of Polymer Science, 2nd, Ed., Chapters 11 and 12, pp. 328-376 (Wiley-Interscience, a Division of John Wiley and Sons, Inc.), 1971.
Barclay George G.
Caporale Stefan J.
Kavanagh Robert J.
Pugliano Nick
Ashton Rosemary
Corless Peter F.
Edwards & Angell LLP
Frickey Darryl P.
Shipley Company L.L.C.
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