4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Masking of sidewall
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Method for forming a fine pattern of a semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
Reexamination Certificate

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Method for pitch reduction

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
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Method of dry etching for patterning refractory metal layer impr

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
Patent

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Method of forming sub-micron-size structures over a substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
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Methods of forming fine patterns in the fabrication of...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
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