Method and system for processing multi-layer films

Details Method and system for processing multi-layer films Method and system for processing multi-layer films

2006-04-25

2006-04-25

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

With measuring, testing, or inspecting

C216S059000, C438S014000, C438S016000

Reexamination Certificate

active

07033518

ABSTRACT:
A method of etching multi-layer films, the method including: (1) etching a plurality of layers according to etching parameters, (2) determining a plurality of optical characteristics each associated with one of the plurality of layers and determined during the etching of the associated one of the plurality of layers, and (3) determining dynamic etch progressions each based on one of the plurality of optical characteristics that is associated with a particular one of the plurality of layers undergoing the etching.

REFERENCES:
patent: 6300251 (2001-10-01), Pradeep et al.
patent: 6498045 (2002-12-01), Gu
patent: 6712927 (2004-03-01), Grimbergen et al.
patent: 6755932 (2004-06-01), Masuda et al.

Affiliated with

Also associated with

Rating

Method and system for processing multi-layer films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for processing multi-layer films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for processing multi-layer films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3620904