Substrate material for X-ray optical components

Details Substrate material for X-ray optical components Substrate material for X-ray optical components

2006-04-18

2006-04-18

Ho, Allen C. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S084000, C378S085000, C250S492200, C501S004000

Reexamination Certificate

active

07031428

ABSTRACT:
There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6K−1in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.

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