Ultra-fine microfabrication method using an energy beam

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427552, 216 48, 216 94, 430 5, G03C 500, B44C 122, B05D 300

Patent

active

06007969&

ABSTRACT:
An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

REFERENCES:
patent: 3680028 (1972-07-01), Black et al.
patent: 4352835 (1982-10-01), Holbrook et al.
patent: 4407695 (1983-10-01), Deckman et al.
patent: 4664748 (1987-05-01), Ueno et al.
patent: 4835392 (1989-05-01), Loschner et al.
patent: 5256587 (1993-10-01), Jun et al.
patent: 5382315 (1995-01-01), Kumar
patent: 5466627 (1995-11-01), Lur et al.
patent: 5656349 (1997-08-01), Gomi et al.
patent: 5871870 (1999-02-01), Alwan
Fusao Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J. Appl. Phys. 66(6),Sep. 15, 1989, published by 1989 American Institute of Physics, 1989, pp. 2613-2618.
Tetsuro Nakamura et al., "Fabrication Technology of Integrated Circuit", published by Sangyo Tosho Publishing Company (Japan), 1987, pp. 21-23 (includes English translation).
Masayuki Nakao et al., "3-dimensional Handling in Nano Manufacturing World", Proceedings of 71st Fall annual meeting of the Japan Society of Mechanical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. F, pp. 273-275 (includes English Abstract).
Masayuki Nakao et al., "Realization of 3-D Manufacturing in Nano Manufacturing World", Proceedings of 71st Spring annual meeting of the Japan Society of Mechnical Engineers, published by the Japan Society of Mechanical Engineers, 1993, vol. IV, pp. 485-486 (includes English Abstract).
U.S. Patent Application Serial No. 08/617,356 , filed Mar. 18, 1996, entitled "Fabrication Method with Energy Beam and Fabrication Apparatus Therewith", by Masahiro Hatakeyama et al.
U.S. Patent Application Serial No. 08/621,990, filed Mar. 26, 1996, entitled "Micro-Processing Apparatus and Method Therefor", by Masahiro Hatakeyama et al., located in Group Art Unit 2506.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultra-fine microfabrication method using an energy beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra-fine microfabrication method using an energy beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra-fine microfabrication method using an energy beam will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2381193

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.