Photoresist suck-back device in manufacturing system for semicon

Details Photoresist suck-back device in manufacturing system for semicon Photoresist suck-back device in manufacturing system for semicon

1998-09-24

2000-07-04

Recla, Henry J.

Fluid sprinkling, spraying, and diffusing

With cleaning means, drip collecting, waste disposal or soil...

Nozzle cleaner, flusher or drainer

239119, 251 57, 251 611, 1374675, B05B 1502

Patent

active

060826290

ABSTRACT:
A photoresist suck-back device is shown for a photoresist supply apparatus in a semiconductor device manufacturing system which prevents the accumulation of photoresist inside a photoresist spray line. The suck-back device is composed of a suck-back valve which is installed on a photoresist spray line connected to a photoresist supply line of a photoresist supply apparatus. The suck-back valve is constructed of a suction chamber for sucking the photoresist remaining within the photoresist spray line. The suction chamber is shrinkable and has a shape such that the sucked photoresist is not accumulated therein. A control part controls the size of the suction chamber of the suck-back valve through an air line. A cut-off valve is disposed between the photoresist supply line and the photoresist spray line which opens and closes the photoresist supply line under control of the control part through the air line.

REFERENCES:
patent: 5857661 (1999-01-01), Amada et al.

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