Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-11-08
1998-12-15
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
43027016, 430327, 430330, 430947, G03C 500
Patent
active
058494650
ABSTRACT:
A photosensitive liquid precursor solution including titanium carboxyketoesters or titanium carboxydiketonates polymerizes upon exposure to ultraviolet radiation. The solution is applied to an integrated circuit substrate, masked, and exposed to ultraviolet radiation to pattern the liquid precursor film. Unexposed portions of the film are removed in a developer solution including alcohol and water. The remaining portion of the film constitutes a pattern that may be annealed to form a metal oxide.
REFERENCES:
patent: 4883741 (1989-11-01), Takahashi et al.
patent: 5021398 (1991-06-01), Sharma et al.
patent: 5384076 (1995-01-01), Sato et al.
patent: 5428103 (1995-06-01), Friebe et al.
Micro-Patterning of PbZr.sub.x Ti.sub.1 -.sub.x O.sub.3 Thin Films; By Photo Sensitive Sol-Gel Solution; Aug. 21, 1993.
VLSI Technology; Second Edition; By S.M. Sze; Copyright 1988; pp. 141-179.
Ogi Katsumi
Soyama Nobuyuki
Uchida Hiroto
Ashton Rosemary
Baxter Janet C.
Mitsubishi Materials Corporation
Symetrix Corporation
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