Coating apparatus
Gas or vapor deposition
With treating means
Inventor
active
Dry-etch of indium and tin oxides with C2H5I gas
Electrostatic chuck for magnetic flux processing
Erosion resistant electrostatic chuck
Etch back process approach in dual source plasma reactors
Focus ring for semiconductor wafer processing in a plasma reacto
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Profile ID: LFUS-PAI-P-346444