Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1994-07-18
1997-01-07
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
055923585
ABSTRACT:
An electrostatic chuck 20 for holding substrates 42 in a process chamber 40 containing a magnetic flux 43 comprises a base 22 having an upper surface adapted to support a substrate 42 thereon. An insulator 26 with an electrode 24 therein, is on the base 22. A magnetic shunt 34 comprising a ferromagnetic material is positioned (i) either on the base 22, or (ii) in the insulator 26, or (iii) directly below, and contiguous to, the base 22.
REFERENCES:
patent: 4184188 (1980-01-01), Briglia
patent: 4384918 (1983-05-01), Abe
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 4431473 (1984-02-01), Okano et al.
patent: 4771730 (1988-09-01), Tezuka
patent: 5155652 (1992-10-01), Logan et al.
patent: 5184398 (1993-02-01), Moslehi
patent: 5310453 (1994-05-01), Fukusawa et al.
patent: 5484485 (1996-01-01), Chapman
European Search Report, Application EP 95 11 1280.4, dated Nov. 3, 1995.
Klein, Allen J., "Curing Techniques for Composites," Advanced Composites, Mar./Apr. 1988, pp. 32-44.
"Data Sheet . . . Breathers and Bleeders," Data Sheet from Airtech International, Inc., Carson, California (1993).
"Kapton General Information," Technical Brochure from DuPont de Nemours Company, Wilmington, Delaware (1993).
"R/flex.RTM. 1100 High Temperature Materials," Data Sheet DS20903D, Rogers Corporation, Chandler, Arizona (1993).
U.S. Patent application entitled, "An Electrostatic Chuck Having a Grooved Surface," by Roger J. Steger, filed Jul. 20, 1993 (Applied Materials Docket 260).
U.S. Patent application entitled, "Electrostatic Chuck with Erosion-Resistant Electrode Connection".
U.S. Patent application entitled, "Erosion Resistant Electrostatic Chuck".
Cameron John F.
Deshpandey Chandra
Shamouilian Shamouil
Su Yuh-Jia
Applied Materials Inc.
Fleming Fritz
Janah Ashok K.
Sgarbossa Peter J.
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