4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Liquid phase etching

Yu-Lan Chang

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Fabrication method of semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Metal oxide semiconductor transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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Method for forming metal silicide layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method of fabricating metal silicide layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method of fabricating nickel silicide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Profile ID: LFUS-PAI-P-2428743

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