4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Yoshiaki Tanase

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Curved slit valve door

Valves and valve actuation – With means to increase head and seat contact pressure – Spring
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Focus ring for semiconductor wafer processing in a plasma reacto

Coating apparatus – Gas or vapor deposition – With treating means
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Load lock chamber for large area substrate processing system

Material or article handling – Associated with semiconductor wafer handling – Including means for charging or discharging wafer cassette
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Slit valve door seal

Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Yoshiaki Tanase does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Yoshiaki Tanase, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Yoshiaki Tanase will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-1324626

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure