Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate
2007-10-16
2007-10-16
Moore, Karla (Department: 1763)
Coating apparatus
Gas or vapor deposition
Chamber seal
C118S719000, C156S345310, C156S345320, C277S644000, C277S648000, C277S910000
Reexamination Certificate
active
10867344
ABSTRACT:
Embodiments of the invention generally provide a slit valve door seal. In one embodiment, a slit valve door seal includes a ring-shaped base having a center axis and at least one finger extending from the base. The finger is oriented substantially parallel to the center axis, wherein the base and the finger define a single, one-piece seal member. The seal is particularly suitable for using in sealing substrate access passages formed in load lock chambers.
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patent: 5579718 (1996-12-01), Freerks
patent: 6053980 (2000-04-01), Suda et al.
patent: 6074519 (2000-06-01), Lee et al.
patent: 6089543 (2000-07-01), Freerks
patent: 6173969 (2001-01-01), Stoll et al.
patent: 6305695 (2001-10-01), Wilson
patent: 6932354 (2005-08-01), Kane et al.
Kurita, et al., “Load Lock Chamber for Large Area Substrate Processing System”, U.S. Appl. No. 10/832,795 Filed Apr. 26, 2004.
Haworth Paul Andrew
Sterling William Norman
Tanase Yoshiaki
Applied Materials Inc.
Moore Karla
Patterson & Sheridan LLP
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