4. Semiconductor device manufacturing: process
  5. Formation of semiconductive active region on any substrate
  6. Fluid growth from gaseous state combined with preceding...

Yihwan Kim

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Carbon precursors for use during silicon epitaxial film...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Epitaxial deposition process and apparatus

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
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Formation and treatment of epitaxial layer containing...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from solid or gel state
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Formation and treatment of epitaxial layer containing...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Formation of epitaxial layer containing silicon and carbon

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with preceding...
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Profile ID: LFUS-PAI-P-2253906

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