4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Yan Rozenzon

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Chlorine reduction module

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Contaminant reduction improvements for plasma etch chambers

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Contaminant reduction improvements for plasma etch chambers

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Quick release process kit

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Temperature controlled window with a fluid supply system

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With heating or cooling means for apparatus part other than...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-512815

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