4. Radiant energy
  5. With charged particle beam deflection or focussing
  6. With target means

Toyotaka Kataoka

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Apparatus for forming silicon oxide film and method of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Apparatus for forming silicon oxide film and method of...

Coating apparatus – Condition responsive control
Reexamination Certificate

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Charged particle beam exposure system using line beams

Radiant energy – With charged particle beam deflection or focussing – With target means
Patent

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Fabrication method for semiconductor devices and transparent mas

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent

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Method of fabricating PMOS and NMOS transistor on the same...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1281978

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