Charged particle beam exposure system using line beams

Details Charged particle beam exposure system using line beams Charged particle beam exposure system using line beams

1989-03-28

1990-12-25

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

250396R, 2504922, H01J 3730

Patent

active

049805673

ABSTRACT:
In a charged particle beam exposure system, a line of individual blanking apertures (39.sub.0 to 39.sub.255) is provided to form a line of beams which are individually blanked and unblanked by applying voltages to electrodes within the blanking apertures.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda et al.
patent: 4200794 (1980-04-01), Newberry et al.
patent: 4409487 (1983-10-01), Kuschel et al.
patent: 4472636 (1984-09-01), Hahn
patent: 4633090 (1986-12-01), Hahn
patent: 4724328 (1988-02-01), Lischke
patent: 4742234 (1988-05-01), Feldman

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