Coating apparatus
Gas or vapor deposition
With treating means
Inventor
active
Ammonium halide eliminator, chemical vapor deposition system...
Exhaust processing apparatus
Gas-phase growing method and apparatus for the method
Substrate processing apparatus and substrate processing method
Substrate processing apparatus and substrate processing method
No associations
LandOfFree
Toshimitsu Ohmine does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Toshimitsu Ohmine, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Toshimitsu Ohmine will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-397791