Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

1993-03-25

1998-06-16

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118708, 118712, 118715, 118719, 20429825, 156345, 427 9, 427 10, C23C 1600

Patent

active

057663602

ABSTRACT:
A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.

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