Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

1998-04-07

1999-04-27

Bueker, Richard

Coating processes

Measuring, testing, or indicating

427 10, 4272481, 438 5, 438 7, C23C 1600

Patent

active

058977104

ABSTRACT:
A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.

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