4. Active solid-state devices (e.g., transistors, solid-state diode
  5. With means to control surface effects
  6. Insulating coating

Tatsuya Usami

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Carbon containing silicon oxide film having high ashing...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Carbon containing silicon oxide film having high ashing...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Chamber etching of plasma processing apparatus

Etching a substrate: processes – Etching and coating occur in the same processing chamber
Patent

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Chamber etching of plasma processing apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Dual damascene circuit with upper wiring and interconnect...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Profile ID: LFUS-PAI-P-526323

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