4. Coating processes
  5. Heat decomposition of applied coating or base material

Tatsuhiko Shibuya

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Material for forming silica based film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Method for the formation of a silica-based coating film

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent

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Method for the formation of a siliceous coating film

Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...
Reexamination Certificate

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Method for the formation of a siliceous coating film

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
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Polysilazane-based coating solution for interlayer insulation

Coating processes – Heat decomposition of applied coating or base material
Patent

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Profile ID: LFUS-PAI-P-1856339

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