4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Takayoshi Maeda

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Apparatus for vapor-phase growth

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Epitaxially grown compound-semiconductor crystal

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Group III-V compound semiconductor and method of producing...

Stock material or miscellaneous articles – Structurally defined web or sheet – Discontinuous or differential coating – impregnation or bond
Reexamination Certificate

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III-V compound semiconductor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – With lattice constant mismatch
Reexamination Certificate

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Method for fabricating III-V group compound semiconductor

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor
Reexamination Certificate

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Profile ID: LFUS-PAI-P-605250

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