Apparatus for vapor-phase growth

Details Apparatus for vapor-phase growth Apparatus for vapor-phase growth

1988-11-10

1990-12-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118715, 118725, 118730, C23C 1600

Patent

active

049762168

ABSTRACT:
In an apparatus for vapor-phase growth which comprises a reactor having an inlet for the introduction of the gas containing a source material on its top and a susceptor provided in the downstream portion of the reactor, the improvement wherein the susceptor is generally in a conical or polygonal pyramid form consisting of an upper rectifying portion and a lower substrate holding portion, with the diameter of the susceptor in its lower portion increasing by a greater degree than in its upper portion.

REFERENCES:
patent: 4596208 (1986-06-01), Wolfson et al.
patent: 4638762 (1987-01-01), Kim et al.
British Search Report.

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