4. Electric lamp and discharge devices: systems
  5. Discharge device load with fluent material supply to the...
  6. Plasma generating

Taejoon Han

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Pre-endpoint techniques in photoresist etching

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Wafer area pressure control for plasma confinement

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Wafer area pressure control for plasma confinement

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Wafer area pressure control for plasma confinement

Coating apparatus – Gas or vapor deposition – With treating means
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Waferless automatic cleaning after barrier removal

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2528831

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