Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Ion implantation of dopant into semiconductor region
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Depth of focus (DOF) for trench-first-via-last (TFVL)...
Flash memory with less susceptibility to charge gain and...
Integrated circuit having double bottom anti-reflective...
Integrated circuit having increased gate coupling capacitance
Integrated circuit having optimized gate coupling capacitance
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Profile ID: LFUS-PAI-P-809757