4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Shigeru Terashima

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Electron beam exposure apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate

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Electron beam exposure apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent

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Exposure apparatus

Photocopying – Projection printing and copying cameras – Detailed holder for original
Reexamination Certificate

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Exposure apparatus

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate

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Exposure apparatus

Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate

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Profile ID: LFUS-PAI-P-366319

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