Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1998-01-26

2000-04-25

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3730

Patent

active

060547138

ABSTRACT:
An electron beam exposure apparatus, which illuminates a mask with light emitted by a light source, photoelectrically converts the light patterned by the mask using a photoelectric converter, and exposes an object to be exposed with a patterned electron beam emitted by the photoelectric converter. The apparatus includes an electron optical system for imaging the electron beam emitted by the photoelectric converter onto the object, an axial shifter for shifting an optical center of the electron optical system in a direction perpendicular to an optical axis, an axial deflector for deflecting the electron beam that propagates in the electron optical system, a region limiter for limiting a region of the mask to be projected onto the object via the photoelectric converter and the electron optical system to a partial region of the mask, and a scan controller for scanning the object with the region-limited electron beam by changing the partial region to be limited while controlling the axial shifter and axial deflector.

REFERENCES:
patent: 4705956 (1987-11-01), Ward
patent: 4789786 (1988-12-01), Yasuda
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5023462 (1991-06-01), Yamada et al.
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5157700 (1992-10-01), Kurosawa et al.
patent: 5345292 (1994-09-01), Shiozawa et al.
patent: 5363170 (1994-11-01), Muraki
patent: 5777747 (1998-07-01), Tanaka

Affiliated with

Also associated with

Rating

Electron beam exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-995137